Ion implantation with focused ion beams.

Recent developments in nanofabrication using focused ion beams.

Focused ion beam (FIB) technology has become increasingly popular in the fabrication of nanoscale structures. In this paper, the recent developments of the FIB technology are examined with emphasis on its ability to fabricate a wide variety of nanostructures. FIB-based nanofabrication involves four major approaches: milling, implantation, ion-induced deposition, and ion-assisted etching of mate...

Morphology Control of Carbon Nanotubes through Focused Ion Beams

This research demonstrates the capability of controlled, focused ion beam (FIB)–assisted tailoring of morphologies in both multiwall carbon nanotubes (CNTs) and Y junction nonlinear CNT systems through defect engineering. We have shown that a 30 keV FIB Ga ion beam at low ion milling currents of 1 pA can be used to partially reduce the CNT diameter, to provide electrical conduction bottleneck m...

Focused Ion Beam Lithography

Molecular depth profiling with cluster ion beams.

Peptide-doped trehalose thin films have been characterized by bombardment with energetic cluster ion beams of C60+ and Aux+ (x = 1, 2, 3). The aim of these studies is to acquire information about the molecular sputtering process of the peptide and trehalose by measurement of secondary ion mass spectra during erosion. This system is important since uniform thin films of approximately 300 nm thic...

Photochemical degradation of azure-b with sulphate radical ion generated by peroxydisulphate ion with cupric ion

In this paper, the photochemical degradation of azure-b by Cu2+/S2O82− process has beenpresented. Cu2+ as photocatalyst and S2O82− ion as photooxidant used in this process. Atextremely low concentrations, cupric ion showed true catalytic activity in the overall process.The influence of various parameters on the performance of the treatment process has beenconsidered, such as pH, concentration o...